For citations:
Shemardov S.G., Beklemisheva A.V., Alexandrov P.A., Vasiliev A.L., Beklemishev V.N. Poly-energy implantation of helium ions into silicon. Vestnik natsional'nogo issledovatel'skogo yadernogo universiteta "MIFI". 2025;14(5):452-456. (In Russ.) https://doi.org/10.26583/vestnik.2025.5.8. EDN: YATPCV
 
                     
         
             
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